Planar Alloy Sputtering Target

Planar Alloy Sputtering Target
Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.
High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target
High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.
Uniform grain: Controlled grain size and direction
Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.

* Maximum sizes of planar target
Thickness: 30mm (can be 60mm for round target)
Width: max 2000mm
Length: max 4000mm

* Maximum sizes of rotary target
Vacuum/Air Spraying
Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm
Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm
Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm
Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm